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Title: :  Characterization Compare Procesess And Parametre Of SS304 Between Nitriding and Thin Film Deposition Of TiN By Reactive Magnetron Sputtering
PaperId: :  1392
Published in:   International Journal Of Advance Research And Innovative Ideas In Education
Publisher:   IJARIIE
e-ISSN:   2395-4396
Volume/Issue:    Volume 1 Issue 5 2015
DUI:    16.0415/IJARIIE-1392
Licence: :   IJARIIE is licensed under a Creative Commons Attribution-ShareAlike 4.0 International License.

Author NameAuthor Institute
Mohd AslamGAUTAM BUDHA UNIVERSITY
Dr. Satpal SharmaGAUTAM BUDHA UNIVERSITY
Mohd Usman AhmadGAUTAM BUDHA UNIVERSITY
Anam ParveenGAUTAM BUDHA UNIVERSITY

Abstract

Mechanical Engineering
RMSP1, Coating2, Nitriding3, EDX4, XRD5, Microhardness Test6
From last few decades we are using thin film coating and nitriding for the improvement of surface modification. This is also improving mechanical properties wear, corrosion and improving service life of the material, Nitriding is improve hardness of the material fromsurface to some depth and ultimately increase toughness, hardness and also Improve wear resistant of the material and increases productivity. Coating gives different different color depend on the what will be used target for the coating like TiN gives gold color, here we are using two Ti target and flow of reacting gas is Nitrogen . The TiN coating is improving hardness up to 24 Nano-meter thickness will the 1 to 7µ depend on time of experiment and substrate temperature. The uses of TiN thin film coating in universal use, coating on the tool material, forming like molds and dies and also uses for the decorating purpose. We are using Ti Target and reactive magnetron sputtering process for the coating of TiN on the substrate material SS304 and also for the nitriding H2 gas uses for the flushing and H2+N2 gas uses for the nitriding at a certain temperature and pressure inside a vacuum chamber. Here we are characterizing MicrohardnessTest, X-Ray Deposition, and Energy (XRD)Dispersive Spectroscopy (EDS) Field Emission Scanning Electron Microscopy (FESEM). The purpose and conclusion of various analysis’s is that improve the hardness, corrosion, wear resistance and toughness of the material ss304 by using of reactive magnetron sputtering (RMS) and Nitriding process.

Citations

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IJARIIE Mohd Aslam, Dr. Satpal Sharma, Mohd Usman Ahmad, and Anam Parveen. "Characterization Compare Procesess And Parametre Of SS304 Between Nitriding and Thin Film Deposition Of TiN By Reactive Magnetron Sputtering" International Journal Of Advance Research And Innovative Ideas In Education Volume 1 Issue 5 2015 Page 72-86
MLA Mohd Aslam, Dr. Satpal Sharma, Mohd Usman Ahmad, and Anam Parveen. "Characterization Compare Procesess And Parametre Of SS304 Between Nitriding and Thin Film Deposition Of TiN By Reactive Magnetron Sputtering." International Journal Of Advance Research And Innovative Ideas In Education 1.5(2015) : 72-86.
APA Mohd Aslam, Dr. Satpal Sharma, Mohd Usman Ahmad, & Anam Parveen. (2015). Characterization Compare Procesess And Parametre Of SS304 Between Nitriding and Thin Film Deposition Of TiN By Reactive Magnetron Sputtering. International Journal Of Advance Research And Innovative Ideas In Education, 1(5), 72-86.
Chicago Mohd Aslam, Dr. Satpal Sharma, Mohd Usman Ahmad, and Anam Parveen. "Characterization Compare Procesess And Parametre Of SS304 Between Nitriding and Thin Film Deposition Of TiN By Reactive Magnetron Sputtering." International Journal Of Advance Research And Innovative Ideas In Education 1, no. 5 (2015) : 72-86.
Oxford Mohd Aslam, Dr. Satpal Sharma, Mohd Usman Ahmad, and Anam Parveen. 'Characterization Compare Procesess And Parametre Of SS304 Between Nitriding and Thin Film Deposition Of TiN By Reactive Magnetron Sputtering', International Journal Of Advance Research And Innovative Ideas In Education, vol. 1, no. 5, 2015, p. 72-86. Available from IJARIIE, http://ijariie.com/AdminUploadPdf/Characterization_Compare_Procesess_And_Parametre_Of_SS304_Between_Nitriding_and_Thin_Film_Deposition_Of_TiN_By_Reactive_Magnetron_Sputtering_ijariie1392_1__volume_1_1_page_72_86.pdf (Accessed : 02 September 2018).
Harvard Mohd Aslam, Dr. Satpal Sharma, Mohd Usman Ahmad, and Anam Parveen. (2015) 'Characterization Compare Procesess And Parametre Of SS304 Between Nitriding and Thin Film Deposition Of TiN By Reactive Magnetron Sputtering', International Journal Of Advance Research And Innovative Ideas In Education, 1(5), pp. 72-86IJARIIE [Online]. Available at: http://ijariie.com/AdminUploadPdf/Characterization_Compare_Procesess_And_Parametre_Of_SS304_Between_Nitriding_and_Thin_Film_Deposition_Of_TiN_By_Reactive_Magnetron_Sputtering_ijariie1392_1__volume_1_1_page_72_86.pdf (Accessed : 02 September 2018)
IEEE Mohd Aslam, Dr. Satpal Sharma, Mohd Usman Ahmad, and Anam Parveen, "Characterization Compare Procesess And Parametre Of SS304 Between Nitriding and Thin Film Deposition Of TiN By Reactive Magnetron Sputtering," International Journal Of Advance Research And Innovative Ideas In Education, vol. 1, no. 5, pp. 72-86, Nov-Dec 2015. [Online]. Available: http://ijariie.com/AdminUploadPdf/Characterization_Compare_Procesess_And_Parametre_Of_SS304_Between_Nitriding_and_Thin_Film_Deposition_Of_TiN_By_Reactive_Magnetron_Sputtering_ijariie1392_1__volume_1_1_page_72_86.pdf [Accessed : 02 September 2018].
Turabian Mohd Aslam, Dr. Satpal Sharma, Mohd Usman Ahmad, and Anam Parveen. "Characterization Compare Procesess And Parametre Of SS304 Between Nitriding and Thin Film Deposition Of TiN By Reactive Magnetron Sputtering." International Journal Of Advance Research And Innovative Ideas In Education [Online]. volume 1 number 5 (02 September 2018).
Vancouver Mohd Aslam, Dr. Satpal Sharma, Mohd Usman Ahmad, and Anam Parveen. Characterization Compare Procesess And Parametre Of SS304 Between Nitriding and Thin Film Deposition Of TiN By Reactive Magnetron Sputtering. International Journal Of Advance Research And Innovative Ideas In Education [Internet]. 2015 [Cited : 02 September 2018]; 1(5) : 72-86. Available from: http://ijariie.com/AdminUploadPdf/Characterization_Compare_Procesess_And_Parametre_Of_SS304_Between_Nitriding_and_Thin_Film_Deposition_Of_TiN_By_Reactive_Magnetron_Sputtering_ijariie1392_1__volume_1_1_page_72_86.pdf
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