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Call for Papers:Vol.9 Issue.2

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Title: :  Process parameters monitoring and control using RF technology
PaperId: :  2045
Published in:   International Journal Of Advance Research And Innovative Ideas In Education
Publisher:   IJARIIE
e-ISSN:   2395-4396
Volume/Issue:    Volume 2 Issue 2 2016
DUI:    16.0415/IJARIIE-2045
Licence: :   IJARIIE is licensed under a Creative Commons Attribution-ShareAlike 4.0 International License.

Author NameAuthor Institute
Prashant HandeAISSMS Institute of Information Technology, Pune
Chetan GaikwadAISSMS Institute of Information Technology, Pune
Ajinkya MohiteAISSMS Institute of Information Technology, Pune

Abstract

Instrumentation Engineering
Micro-controller AT89S52, Sensors, RF Transceiver, Driver circuit.
In today’s world networking is important part of industrial automation for monitoring and control of industrial process parameters. To provide this automation we implement a system which uses 8051 Processor with RF & sensors. This design basically consists of RF communication module, processor module and sensor interface module. Due to which system has high performance and offers widest range of features such as flexibility, reliability, durability when compared with conventional and old solution to monitor and control. The main aim of our project is to implement an Industrial automation console that can be easily accessible from distant places through system running inside the industry. The basic functionalities in this proposed system includes automatic control of temperature, level, & gas parameters.

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IJARIIE Prashant Hande, Chetan Gaikwad, and Ajinkya Mohite. "Process parameters monitoring and control using RF technology" International Journal Of Advance Research And Innovative Ideas In Education Volume 2 Issue 2 2016 Page 1764-1766
MLA Prashant Hande, Chetan Gaikwad, and Ajinkya Mohite. "Process parameters monitoring and control using RF technology." International Journal Of Advance Research And Innovative Ideas In Education 2.2(2016) : 1764-1766.
APA Prashant Hande, Chetan Gaikwad, & Ajinkya Mohite. (2016). Process parameters monitoring and control using RF technology. International Journal Of Advance Research And Innovative Ideas In Education, 2(2), 1764-1766.
Chicago Prashant Hande, Chetan Gaikwad, and Ajinkya Mohite. "Process parameters monitoring and control using RF technology." International Journal Of Advance Research And Innovative Ideas In Education 2, no. 2 (2016) : 1764-1766.
Oxford Prashant Hande, Chetan Gaikwad, and Ajinkya Mohite. 'Process parameters monitoring and control using RF technology', International Journal Of Advance Research And Innovative Ideas In Education, vol. 2, no. 2, 2016, p. 1764-1766. Available from IJARIIE, http://ijariie.com/AdminUploadPdf/Process_parameters_monitoring_and_control_using_RF_technology_ijariie2045.pdf (Accessed : ).
Harvard Prashant Hande, Chetan Gaikwad, and Ajinkya Mohite. (2016) 'Process parameters monitoring and control using RF technology', International Journal Of Advance Research And Innovative Ideas In Education, 2(2), pp. 1764-1766IJARIIE [Online]. Available at: http://ijariie.com/AdminUploadPdf/Process_parameters_monitoring_and_control_using_RF_technology_ijariie2045.pdf (Accessed : )
IEEE Prashant Hande, Chetan Gaikwad, and Ajinkya Mohite, "Process parameters monitoring and control using RF technology," International Journal Of Advance Research And Innovative Ideas In Education, vol. 2, no. 2, pp. 1764-1766, Mar-App 2016. [Online]. Available: http://ijariie.com/AdminUploadPdf/Process_parameters_monitoring_and_control_using_RF_technology_ijariie2045.pdf [Accessed : ].
Turabian Prashant Hande, Chetan Gaikwad, and Ajinkya Mohite. "Process parameters monitoring and control using RF technology." International Journal Of Advance Research And Innovative Ideas In Education [Online]. volume 2 number 2 ().
Vancouver Prashant Hande, Chetan Gaikwad, and Ajinkya Mohite. Process parameters monitoring and control using RF technology. International Journal Of Advance Research And Innovative Ideas In Education [Internet]. 2016 [Cited : ]; 2(2) : 1764-1766. Available from: http://ijariie.com/AdminUploadPdf/Process_parameters_monitoring_and_control_using_RF_technology_ijariie2045.pdf
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